PI Name & Affiliation:
Dr. Sitaram Dash,
Professor & Senior Scientist,
School of Mechanical Engineering,
Vellore Institute of Technology, India
Co-PI Name & Affiliation:
Dr. U. Narendra Kumar,
Associate Professor (Sr.)
School of Mechanical Engineering,
Vellore Institute of Technology, India
Funding Agency: BRNS in collaboration with RRCAT
Scheme: Regular Research
Duration of the Project: 3 Years
Dr. Sitaram Dash
Professor & Senior Scientist
Dr. U. Narendra Kumar
Associate Professor (Sr.)
Project Description
The project is a Technology Demonstrator (TD) which aims to achieve an internal diameter coating with a maximum thickness of 1.5 μm. The internal walls of vacuum chamber with 500 mm length and ~125 mm diameter will be coated with pulsed DC reactive magnetron sputtering with Secondary Electron Yield (SEY) well below 1.6. The variation in thickness will be maintained within ±15% Av. The surface roughness, a contributing factor towards SEY will be maintained around an rms value of 30 nm. The stoichiometry control in TiN will be achieved by downstream pressure management where mass flows of N2/Ar will be continuously varied. Process parameters including the deposition temperature will be carefully controlled to get film adhesion.
Phase characterization and scratch-adhesion tests will be executed to get the information on quality of the coating.
The equipment for this project is a cylindrical magnetron sputtering system. The customized equipment is in advanced stage of fabrication.