Spin Coating-cfm-facilities

Spin Coating

Spin coating is the simplest method for fabricating a film on a substrate. Thin-resist layers for photolithography are coated with this technique. The spin-coating process starts with the dilution of the material to be deposited in a solvent. The solution is subsequently dispensed on the substrate surface. The wafer is then spun at a high speed. The thickness of the film is determined by the spinning speed, surface tension, and viscosity of the solution. The solvent is removed partly during the spinning process due to evaporation and partly by subsequent baking at elevated temperatures. Spin coating results in a relatively planar surface. This technique is often used for planarization purposes.

Specifications:

• Make and Model: Apex-spin NXG-ACH
• Spin coating unit with vacuum pump and heater
• Programmable digital process controller for repeatable, accurate processing
• Maximum 10000 rpm

Research Focus:

• Ferrite thin films for recording media applications
• Gas sensors
• Organic Solar cells