Electron Beam Evaporation-cfm-facilities

Electron Beam Evaporation

Electron beam evaporation is one of the thin film deposition methods where the direct transfer of energy with the electron beam to the target material to be evaporated making it ideal for metals with high melting points. By concentrating the energy on the target rather than the entire vacuum chamber, it helps reduce the possibility of heat damage to the substrate. And multiple thin film can be deposited sequentially without breaking vacuum and can deposit thinner films with higher purity. The equipment Electron beam Gun power supply Model: EGC-3KW has HT and LT transformer, HT inductor, bleeder resistor and with this, at the top controlling unit consist of the voltage and current stabilizer with all the other controls to operate the gun is provided. Beam voltage indicated on two wide view meters provided with 0 to 10 KVDC meter (calibrated on 0-500 micro amp meter) for voltage and 0 to 500 mA DC meter for emission current. And the power supply can connect with Vacuum unit for deposition of thin film. Which consists vacuum chamber and pumping system