Magnetron Sputtering-cfm-facilities

Magnetron Sputtering

Magnetron sputtering is extremely basic and useful tool to deposit thin films. The high voltage is applied to the sputtering gun which ionizes the sputtering gas. These high energy ions create gaseous plasma when bombarded on the target material to be deposited. The gaseous plasma contains the material to be deposited. The atoms travel in vacuum and deposited onto a desired substrate to form a thin film of target material. One can tune the sputtering pressure, substrate temperature to get the optimized thin film.

Specifications:

• Brand: VacuTech Systems
• Two sputtering guns (DC and RF)
• Maximum power 300 W
• Temperature: 500 oC
• Base pressure: 1 × 10^-6 mTorr

Research Focus:

• Thin films for solar cell application
• Metal electrode deposition